Proton beam fabrication of nickel stamps for nanoimprint lithography注意:本论文已在Nuclear Instruments
and Methods in Physics Research B 231 (2005) 407–412发表 Abstract:Nickel stamps with micro
and nano-scale relief features on their surfaces have been fabricated
using proton beam writing coupled with nickel sulfamate electroplating.
A focused beam of sub-micron 2.0 MeV protons was used to direct-write
3D patterns into spin coated PMMA resist, and a single step nickel sulfamate
plating process has been used to produce metallic negatives from these
patterns. The fabricated metallic stamps exhibit high aspect ratio surface
patterns with smooth and vertical side-walls. Nano-indentation and atomic
force microscopy (AFM) measurements of the features on the surface of
the stamps indicate a hardness and side-wall roughness of 5 GPa and 7
nm respectively. Using nanoimprint lithography, the stamps fabricated
using proton beam writing and electroplating have been successfully used
to replicate patterns into PMMA. 1、浏览PDF格式全文需要使用软件--Abode Acrobat(由于软件较大并常见,我站不提供下载) 2、下载论文全文请点击鼠标右键“另存为”或使用网络蚂蚁下载(290KB) 本站收录的本文作者的其他论文: 4、Dosing system for the nanolitre range,fabricated with the AMANDA process |
欢迎您参加讨论,发表您对此论文及其研究领域的看法!
(请在发言时在标题中使用所点评的论文的题目或研究方向,这样方便大家浏览!)
返回首页 | CIMS论文 | 并行工程 | 虚拟制造 | 敏捷制造 | 其他论文 | 项目开发 | 学术资源 | 站内全文搜索 | 免费论文网站大全 |
为了更好的为大家服务,欢迎您参加本站的投票调查
>>>>参加更多投票调查请点击! |
本站永久域名:http://www.cimspaper.com欢迎访问
注意:本站内容未经书面允许不得转载